X-RAY INTERFERENCE LITHOGRAPHY for FORMING ORDERED NANOSTRUCTURES

Key-words: nanotechnology, synchrotron radiation, hydrogen photoetching, ordered nanostructure, nanofilters, membrane technology

Sergey Kuzmin, Viacheslav Mathveev, Victor Mishachev

Электроника: Наука. Технология. Бизнес, 2014, спецвыпуск 00137 «50-лет НИИ физических проблем им. Ф.В.Лукина», с.47-56.

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SUMMARY

Some principles of forming ordered nanostructures using X-ray interference lithography are considered. Some methods for fabrication of ordered polymer, inorganic and metal nanofilters with up to 1-nm elements, included photoetching of a thin polymer film by means of space-structured synchrotron radiation are described in detail. Some technological aspects of fabrication of ordered periodical metallic nanostructures by means of interference lithography and multilevel membrane technology are discussed.